Evident BX53-MET Metallurgical Brightfield Darkfield
Dual brightfield and darkfield optical trains define the Evident BX53-MET Metallurgical Brightfield Darkfield, allowing materials scientists to alternate between high reflectance topography and grain boundary defect analysis with one switch.
- 100W halogen lamphouse yields intense reflected illumination
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- 22mm field eyepieces broaden inspection zones
- 100x100mm stroke stage holds oversized metallurgical pucks
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Description
Engineered for multi-mode semiconductor wafer and alloy defect screening, the Evident BX53-MET Metallurgical Brightfield Darkfield delivers 50x to 500x incident magnification across an infinity-corrected UIS2 optical path. Widefield 10x eyepieces provide a 22mm field number. The specialized BD optical train resolves micro-cracks with high contrast, though dense opaque specimens require precise stage leveling.
A heavy 15.4 kg cast-aluminum stand houses a coded quintuple BD nosepiece with four MPlan FL N objectives, an incident white LED illuminator with a MIX slider, and Smart ILS brightness management. The ceramic-coated stage measures 240 by 180 mm with 76 by 52 mm right-hand XY travel. Coaxial focus provides 1-micron fine graduations with a torque lock, paired with a 30-degree inclined trinocular head offering 50mm to 76mm interpupillary spacing and a three-way light split.
Key Features of Evident BX53-MET Metallurgical Brightfield Darkfield
Semiconductor quality engineers and failure analysis metallurgists select this flagship research frame to identify surface anomalies across reflective components. The coded nosepiece links directly with software to recall calibrated scale bars automatically, while the MIX illumination slider combines directional darkfield shadows with brightfield color fidelity.
- Infinity-corrected UIS2 optical system configured for 50x, 100x, 200x, and 500x incident magnification
- MPlan FL N BD semi-apochromatic objectives: 5x/0.15, 10x/0.30, 20x/0.45, and 50x/0.80 BD
- Trinocular viewing tube with 30-degree inclination, 50mm to 76mm IPD range, and 3-position light split
- Widefield WHN10x high-eyepoint eyepieces delivering a broad 22mm field number (FN 22)
- Quintuple coded revolving nosepiece with electronic magnification feedback tracking
- Vertical incident white LED illuminator with MIX slider supporting brightfield, darkfield, and DIC
- Ceramic-coated mechanical stage (240 x 180 mm) with low-position right-hand coaxial controls
- Heavy-duty coaxial coarse and fine focus drive with 1-micron fine graduations and torque lock
UIS2 BD Objective Physics & MIX Contrast Lighting
UIS2 MPlan FL N BD objectives feature dual concentric illumination channels, directing incident light down the core lens for brightfield observation while projecting ring light through an outer darkfield mirror jacket. The motorized MIX slider blends brightfield surface reflectivity with directional darkfield grazing light, illuminating subtle wafer fractures and sub-micron polishing scratches that wash out under flat coaxial beams.
Ceramic Stage Stability & Fine Gearing Mechanics
Low-positioned right-hand coaxial controls allow your forearm to remain resting flat on the table while navigating the 76 by 52 mm stage stroke. The oversized ceramic stage plate resists scratching from rough metal castings, and the coaxial focus assembly tracks through 1-micron fine increments with an adjustable torque lock to prevent stage creep under heavy sample holders.
- Ceramic-coated stage sheet provides lifelong protection against specimen abrasion and etching fluids
- Three-position prism selector routes 100 percent of light to eyepieces, camera port, or an 80:20 split
- Coded nosepiece synchronizes objective magnification with imaging software for instant measurement calibration
Evident Warranty Coverage & Package Inclusions
Evident Olympus protects this metallurgical research frame with a 5-year limited warranty on optical and mechanical assemblies, alongside a 1-year electrical warranty. The complete factory package contains the BX53M frame, BD-MIX illuminator, coded nosepiece, four MPlan FL N BD objectives, two WHN10x/22mm eyepieces, calibration target, and power cord.
Evident Olympus BX53-MET Metallurgical Trinocular Microscope Brightfield Darkfield Mix Infinity Plan Incident LED Specs
| Brand | Evident Olympus |
| Full Model Code / SKU | BX53-MET-BDMIX / BX53M-System |
| Country of Origin | Japan |
| Microscope Type | Advanced Research-Grade Incident Materials Metallurgical Microscope System |
| Optical System Type | UIS2 Optical System (Universal Infinity System) providing fully corrected chromatic aberration profiles |
| Observation Tube Type | Trinocular Head Unit with interpupillary adjustment tracking from 50 mm to 76 mm and 3-position prism split selector (100:0 / 20:80 / 0:100) |
| Tube Inclination & Rotation | 30° comfortable analytical inclination tilt, 360° rotating head plate design layout |
| Eyepiece / Field of Number | Widefield WHN10x / 22 mm high-eyepoint matching lenses with independent bilateral diopter adjustment controls |
| Nosepiece Design | Quintuple (5-position) coding nosepiece tower block with integrated control link tracking interfaces |
| Objectives Classification | MInfinity Plan Achromatic / Semi-Apochromatic Optical Lenses for high-resolution industrial analysis |
| Objectives Magnification Breakdown | MPlan FL N 5x/0.15 (WD 12.0mm), 10x/0.30 (WD 11.0mm), 20x/0.45 (WD 3.0mm), 50x/0.80 (WD 1.0mm) BD-type configurations |
| Total Magnification Range | Standard 50x, 100x, 200x, and 500x exact technical analytical testing thresholds |
| Focusing Type & Graduation | Coaxial coarse and fine focus control blocks with 1-micron calibration marks and structural torque adjustment locks |
| Stage Dimensions & Surface Coating | Oversized mechanical stage measuring exactly 240 x 180 mm with hard-coat ceramic anti-scratch surface protective shields |
| Stage Travel Range & Controls | Right-hand low-position coaxial tracking drive layout with a stroke travel envelope of 76 x 52 mm |
| Condenser Type & Numerical Aperture | None (Configured for pure epi-illumination incident processing tracking workflows) |
| Illumination Transmitted Type | None |
| Illumination Epi-EPI/Reflected | Epi-illuminator module with integrated MIX slider mechanism combining segment LED layouts with high-contrast structural directional arrays |
| Light Intensity Management | Motic-level contrast optimization tracking managed by built-in Smart ILS (Intensity Manager) auto-voltage software arrays |
| Camera Port / C-Mount Adapter Split | Vertical optical photo path tracking port accepting customizable standard industrial C-mount tube components |
| Contrast Methods Capability | Reflected Brightfield, Darkfield, MIX (Simultaneous Brightfield + Directional Darkfield), Polarized Light, and Differential Interference Contrast (DIC) |
| Power Supply & Voltage Input | Internal universal switching auto-voltage module accepting 100-240V AC electrical currents |
| Physical Dimensions & Net Weight | Chassis depth 439 mm, frame width 284 mm, total assembly height 490 mm, structural framework net weight exactly 15.4 kg |
| Standard Package Accessories Included | BX53M core frame, BD-MIX epi-illuminator, coded nosepiece, set of 4 MPlan FL N BD objectives, WHN10x eyepieces, power cord, calibration target |
| Primary Application & Environment | Semiconductor wafer defect tracking, advanced metallurgy validation labs, failure analysis inspection cells, aerospace material testing |




















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